Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• resistive to UV/O3 oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films. Keywords: aluminium oxide (Al2O3); atomic layer deposition; DNA nanostructure; nanofabrication; nanoimprint lithography; pattern transfer; polymer stamp; replica molding

• corresponding PLLA film (Figure 2c) were characterized by AFM. On the DNA nanotube master template, single DNA nanotubes are observed along with some bundles. After the PLLA stamp was peeled off, the negative replicas of the DNA nanotubes were observed on the polymer stamp, demonstrating a faithful replication

• the ALD (41.14 nm) but was significantly larger than the average FWHM of the trench (23.50 nm) on the polymer stamp. The decrease of the FWHM after the ALD is suspected to be due to the dehydration of the nanotube during the ALD process and/or the differences in the probe–sample interactions of the

Scalable, high performance, enzymatic cathodes based on nanoimprint lithography

• Dmitry Pankratov,
• Richard Sundberg,
• Javier Sotres,
• Dmitry B. Suyatin,
• Ivan Maximov,
• Sergey Shleev and
• Lars Montelius

Beilstein J. Nanotechnol. 2015, 6, 1377–1384, doi:10.3762/bjnano.6.142

• , Sweden) onto a polymer sheet at 160 °C using an imprint pressure of 50 bar for 120 s and demoulding of the stamp at 115 °C for 40 s. For the imprint material, 20 × 20 cm sheets of the intermediate polymer stamp (IPS®) foil, provided by Obducat Technologies AB, was used. The IPS® material is a